Multipurpose deposition system
- Thermal sputtering from three independent resistive-heated evaporators rigged by protecting movable defense screens.
- Rich magazine is completed by different basket, spiral and effusion-type evaporators;
- “Flash”-sputtering from two independent sources with the use of electromagnetic controllNanomaterials processing & Plasma
- Polymerizationer for material batch preparation;
- DC/RF-magnetron sputtering (300 VA) from 3 independent magnetrons using target of convenient size (< 40 mm ΓΈ);
- Electron-beam evaporation;
- Ion-plasma sputtering (350 VA);
|
![Nanomaterials processing & Plasma Polymerization Nanomaterials processing & Plasma Polymerization](http://www.3nanosae.org/files/images/medium/649.jpg) |
RF-plasma reactor Designed for FIA – into a plasma stream
- Nanoparticles synthesis
- Inorgani style=”font-weight: bold; text-decoration: underline;”c copolymers
- Hydride synthesis
|
![Nanomaterials processing & Plasma Polymerization Nanomaterials processing & Plasma Polymerization](http://www.3nanosae.org/files/images/medium/650.jpg) |
DC-plasma reactor
- Plasma polymerization
- Thin polymer films deposition
- Liquid monomer injection
- Thin film nanocomposites
- A new version with FIA system is in development
|
![Nanomaterials processing & Plasma Polymerization Nanomaterials processing & Plasma Polymerization](http://www.3nanosae.org/files/images/medium/651.jpg) |
Heater – 1600 C, controlled atmosphere (in acquisition 2008) |
![Nanomaterials processing & Plasma Polymerization Nanomaterials processing & Plasma Polymerization](http://www.3nanosae.org/files/images/medium/652.jpg) |
Photoresist processing |
|
Thermo centrifugal processing |
|
Electrospinning |
|